CHEMICAL PROPERTIES OF ANb/ZrINTERFACE STUDIED BY XPS

K. C. Wong, P. C. Wong, Y. S. Li and K. A. R. Mitchell
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K. C. Wong: Department of Chemistry, University of British Columbia, 2036 Main Mall, Vancouver, British Columbia, Canada V6T 1Z1, Canada
P. C. Wong: Department of Chemistry, University of British Columbia, 2036 Main Mall, Vancouver, British Columbia, Canada V6T 1Z1, Canada
Y. S. Li: Department of Chemistry, University of British Columbia, 2036 Main Mall, Vancouver, British Columbia, Canada V6T 1Z1, Canada
K. A. R. Mitchell: Department of Chemistry, University of British Columbia, 2036 Main Mall, Vancouver, British Columbia, Canada V6T 1Z1, Canada

Surface Review and Letters (SRL), 1997, vol. 04, issue 01, 33-37

Abstract: A film of niobium(~ 15 Åthick) deposited under ultrahigh vacuum (UHV) conditions on polycrystalline zirconium was studied by x-ray photoelectron spectroscopy (XPS) as it was taken through a series of sequential treatments. The Nb–Zr interface, associated with aNb3d5/2peak at 203.4 eV, is indicated to passivate the underlying Zr to oxygen and hydrogen plasma treatments, which in the absence of Nb would yield substantial oxidation. On heating to 500°C, the pure metallicNb3d5/2component at 202.2 eV appears, and this change is accompanied by removal of the passivation effect on the substrate.

Date: 1997
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DOI: 10.1142/S0218625X97000067

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