Comparison of Cu-MgO Interfaces Studied by EXES and XPS
P. Jonnard,
C. Hombourger,
F. Vergand,
C. Bonnelle,
B. Ealet,
A. Renou and
E. Gillet
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P. Jonnard: Laboratoire de Chimie Physique, Matière et Rayonnement de l'Université Pierre et Marie Curie, URA 176, 11 rue Pierre et Marie Curie, 75231 Paris cedex 05, France
C. Hombourger: Laboratoire de Chimie Physique, Matière et Rayonnement de l'Université Pierre et Marie Curie, URA 176, 11 rue Pierre et Marie Curie, 75231 Paris cedex 05, France
F. Vergand: Laboratoire de Chimie Physique, Matière et Rayonnement de l'Université Pierre et Marie Curie, URA 176, 11 rue Pierre et Marie Curie, 75231 Paris cedex 05, France
C. Bonnelle: Laboratoire de Chimie Physique, Matière et Rayonnement de l'Université Pierre et Marie Curie, URA 176, 11 rue Pierre et Marie Curie, 75231 Paris cedex 05, France
B. Ealet: Laboratoire Structure et Réactivité des Systèmes Métal-Céramique, case 261, Faculté Saint Jérême, 13397 Marseille cedex 20, France
A. Renou: Laboratoire Structure et Réactivité des Systèmes Métal-Céramique, case 261, Faculté Saint Jérême, 13397 Marseille cedex 20, France
E. Gillet: Laboratoire Structure et Réactivité des Systèmes Métal-Céramique, case 261, Faculté Saint Jérême, 13397 Marseille cedex 20, France
Surface Review and Letters (SRL), 1998, vol. 05, issue 01, 369-373
Abstract:
With the aim of studying the physicochemical interactions in metal-ceramic interfaces, we have investigated the Cu-MgO system. Two kinds of interfaces prepared at room temperature have been studied: interfaces during their formation (studied by X-ray photoelectron and Auger spectroscopies — XPS, AES) and buried interfaces (studied by electron-induced X-ray emission spectroscopy — EXES). Auger parameter results reveal a Cu(I) state for copper and point out, by comparison with the Cu-NaCl interface, that the oxidation comes from an interaction at the interface. EXES studies of the oxygen and copper valence densities of states evidence that the same kind of interaction exists at the interface between thick films of Cu and MgO and it does not exceed one interatomic distance.
Date: 1998
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Persistent link: https://EconPapers.repec.org/RePEc:wsi:srlxxx:v:05:y:1998:i:01:n:s0218625x98000682
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DOI: 10.1142/S0218625X98000682
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