Morphology of Silver Thin Films Deposited onTiO2(110)Surfaces

D. Abriou, D. Gagnot, J. Jupille and F. Creuzet
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D. Abriou: Laboratoire CNRS, Saint-Gobain "Surface du Verre et Interfaces," BP 135, F-93303 Aubervilliers, France
D. Gagnot: Laboratoire CNRS, Saint-Gobain "Surface du Verre et Interfaces," BP 135, F-93303 Aubervilliers, France
J. Jupille: Laboratoire CNRS, Saint-Gobain "Surface du Verre et Interfaces," BP 135, F-93303 Aubervilliers, France
F. Creuzet: Laboratoire CNRS, Saint-Gobain "Surface du Verre et Interfaces," BP 135, F-93303 Aubervilliers, France

Surface Review and Letters (SRL), 1998, vol. 05, issue 01, 387-392

Abstract: The growth mode of silver films deposited at room temperature onTiO2(110)surfaces has been examined by means of atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS) in ultrahigh vacuum (UHV) conditions, On clean vacancy-freeTiO2(110)surfaces, 0.1-nm-thick (on average) Ag deposits form a two-dimensional (2D) layer. When the thickness of the silver overlayer is increased, 3D clusters are shown to appear while the 2D film is preserved, furthermore, the influence of surface oxygen vacancies on the growth ofAg/TiO2(110)is evidenced by well-characterized differences in the morphology of 9-nm-thick silver deposits.

Date: 1998
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DOI: 10.1142/S0218625X98000712

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