A New Low Energy Electron Microscope

R. M. Tromp, M. Mankos, M. C. Reuter, A. W. Ellis and M. Copel
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R. M. Tromp: IBM Research Division, T. J. Watson Research Center, PO Box 218, Yorktown Heights, NY 10598, USA
M. Mankos: IBM Research Division, T. J. Watson Research Center, PO Box 218, Yorktown Heights, NY 10598, USA;
M. C. Reuter: IBM Research Division, T. J. Watson Research Center, PO Box 218, Yorktown Heights, NY 10598, USA
A. W. Ellis: IBM Research Division, T. J. Watson Research Center, PO Box 218, Yorktown Heights, NY 10598, USA
M. Copel: IBM Research Division, T. J. Watson Research Center, PO Box 218, Yorktown Heights, NY 10598, USA

Surface Review and Letters (SRL), 1998, vol. 05, issue 06, 1189-1197

Abstract: Low energy electron microscopy (LEEM) has developed into one of the premier techniques forin situstudies of surface dynamical processes, such as epitaxial growth, phase transitions, chemisorption and strain relaxation phenomena. Over the last three years we have designed and constructed a new LEEM instrument, aimed at improved resolution, improved diffraction capabilities and greater ease of operation compared to present instruments.

Date: 1998
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DOI: 10.1142/S0218625X98001523

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