STRUCTURE OF A SINGLE ATOMIC LAYER OF NICKEL DEPOSITED ON THEPt(111)SURFACE DETERMINED BY LOW ENERGY ELECTRON DIFFRACTION

A. Atrei, U. Bardi (), E. Zanazzi, G. Rovida, M. Sambi and G. Granozzi
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A. Atrei: Dipartimento di Scienze e Tecnologie Chimiche e dei Biosistemi, Università di Siena, 53100 Siena, Italy
U. Bardi: Dipartimento di Chimica, Università di Firenze, Via G. Capponi 9. 50129 Firenze, Italy
E. Zanazzi: Dipartimento di Chimica, Università di Firenze, Via G. Capponi 9. 50129 Firenze, Italy
G. Rovida: Dipartimento di Chimica, Università di Firenze, Via G. Capponi 9. 50129 Firenze, Italy
M. Sambi: Dipartimento di Chimica Inorganica, Metallorganica e Analitica, Università di Padova, Via Loredan 4, 35131 Padova, Italy
G. Granozzi: Dipartimento di Chimica Inorganica, Metallorganica e Analitica, Università di Padova, Via Loredan 4, 35131 Padova, Italy

Surface Review and Letters (SRL), 1999, vol. 06, issue 02, 213-217

Abstract: The structure of ultrathin films of Ni deposited at room temperature on thePt(111)surface has been determined by low energy electron diffraction (LEED) intensity analysis. The first monolayer of Ni grows pseudomorphically onPt(111)despite the 11% mismatch between the lattice parameters of nickel and platinum. The results of the analysis also show that the Ni atoms occupy face-centered-cubic sites on the substrate surface. These results in part confirm previous data obtained by X-ray photoelectron diffraction, but also provide more reliable data on the site assignment.

Date: 1999
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DOI: 10.1142/S0218625X9900024X

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