ELECTRON-EXPOSURE EFFECTS ON DESORPTION OFF-(Cl-)AND(F+)(Cl+)IONS FROM ADSORBEDCF2Cl2

Q.-B. Lu and Theodore E. Madey
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Q.-B. Lu: Laboratory for Surface Modification, and Department of Physics and Astronomy, Rutgers, The State University of New Jersey, Piscataway, NJ 08854-8019, USA
Theodore E. Madey: Laboratory for Surface Modification, and Department of Physics and Astronomy, Rutgers, The State University of New Jersey, Piscataway, NJ 08854-8019, USA

Surface Review and Letters (SRL), 1999, vol. 06, issue 03n04, 313-317

Abstract: Electron-exposure effects on the desorption ofF-(Cl-)andF+(Cl+)ions from 1 MLCF2Cl2/Ru(0001), 1 MLCF2Cl2/1 ML Xe/Ru(0001) and 5 MLCF2Cl2/Ru(0001) surfaces have been studied. It is observed that for a≤1MLCF2Cl2/Ru surface, the anion yield shows a rapid decrease with increasing electron exposure, while the cation yield exhibits an increase. In contrast, an opposite behavior is observed for a 5 MLCF2Cl2/Ru surface. For 1 MLCF2Cl2adsorbed on a 1 ML Xe-spacer layer, the effect tends to switch the behavior from the monolayer to the multilayer. These results indicate thatCl-ions accumulated on the multilayer or the monolayer surface on a Xe spacer by the polarization potential have an electrostatic effect on the desorption yields of anions and cations. Moreover, from the attenuation of theF-yield of a 1 MLCF2Cl2-covered surface with electron exposure, the electron-induced dissociation is estimated to be9.2(± 2.0) × 1016cm2.

Date: 1999
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DOI: 10.1142/S0218625X99000305

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