QUANTITATIVE ANALYSIS OF NONCONTINUOUS THIN FILMS BY EELS

V. Matolín () and I. Stará
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V. Matolín: Department of Electronics and Vacuum Physics, Charles University, V Holešovičkách 2, 180 00 Prague 8 , Czech Republic
I. Stará: Department of Electronics and Vacuum Physics, Charles University, V Holešovičkách 2, 180 00 Prague 8 , Czech Republic

Surface Review and Letters (SRL), 1999, vol. 06, issue 05, 801-804

Abstract: Reflection electron energy loss spectroscopy (EELS) operated at low primary electron energyEp(~ 500eV) can be used as a coverage-sensitive probe in the case of supported noncontinuous layers. Quantitative analysis by EELS is substantially complicated by the fact that EEL intensity depends on two material factors:K(E), differential cross section for energy loss ofE, and electron backscattering factorη(Ep). Both factors were determined experimentally using deposit and substrate reference samples. The contribution of pure substrate and pure deposit EEL curves to composed EEL spectra of the investigated deposit/substrate system has been found by fitting it with combination of referenceK(E)λcurves (λstands for IMFP). The fit results corrected usingη(Ep)factors permitted one to evaluate the deposit coverage. The method was tested using the reference Au fractional deposit on the sapphire substrate.

Date: 1999
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DOI: 10.1142/S0218625X99000822

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