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DYNAMIC SCALING IN RECRYSTALLIZATION OF AN ELECTROCHEMICALLY ROUGHENED SILVER ELECTRODE SURFACE IN WATER

Ichiro Otsuka and Takatoshi Iwasaki
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Ichiro Otsuka: Department of Chemistry, Ohu University, Misumido, 31-1, Tomita-Cho, Koriyama 963-8611, Japan
Takatoshi Iwasaki: Department of Physics, Ohu University Misumido, 31-1, Tomita-Cho, Koriyama 963-8611, Japan

Surface Review and Letters (SRL), 1999, vol. 06, issue 05, 923-928

Abstract: We have studied the kinetic mechanisms in recrystallization of an electrochemically roughened silver electrode surface in Ar-saturated water at room temperature using dynamic scaling theory and tapping mode atomic force microscopy (TMAFM). We observed dynamic scaling behavior during the recrystallization. The roughness (α) and growth (β) exponents measured wereα=0.95 ± 0.05andβ=0.16± 0.04for the scale length(L) d. These scaling exponents are relatively close to the predictions(β=0.25, 0.20)of conservative models where surface diffusion is the main mechanism of mass transport in determining a growing surface morphology.

Date: 1999
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DOI: 10.1142/S0218625X99000998

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