THE ROLE OF THE SURFACE ELECTRONIC STRUCTURE IN THE OXIDATION OF IRON

S. J. Roosendaal, A. M. Vredenberg and F. H. P. M. Habraken
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S. J. Roosendaal: Section Interface Physics, Debye Institute, Utrecht PO Box 80.000, 3508 TA, Utrecht, The Netherlands
A. M. Vredenberg: Section Interface Physics, Debye Institute, Utrecht PO Box 80.000, 3508 TA, Utrecht, The Netherlands
F. H. P. M. Habraken: Section Interface Physics, Debye Institute, Utrecht PO Box 80.000, 3508 TA, Utrecht, The Netherlands

Surface Review and Letters (SRL), 1999, vol. 06, issue 06, 1229-1236

Abstract: The Fromhold–Cook coupled-currents theory of metal oxidation states that below~ 150°C, a saturation thickness is reached, which is independent of temperature, as a result of the diminution of the electron tunnel current. However, Fe and Co show a strong temperature dependence of the oxide saturation thickness. In this study, we combine ellipsometry, X-ray Photoelectron Spectroscopy (XPS) and the high energy ion beam technique Elastic Recoil Detection (ERD) for the detailed determination of oxidation rate and oxide thickness, composition, and electronic structure on Fe(100) inO2. At room temperature, first a 1 nm thin FeO film forms, followed by the growth of a 1 nm mixedFe2+/Fe3+layer, which forms the effective barrier against further oxidation. By vacuum annealing at 200°C, theFe3+is reduced toFe2+and the oxidation kinetics through a singleFe2+containing layer can be studied, yielding results in excellent agreement with the FC theory. AtT

Date: 1999
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DOI: 10.1142/S0218625X99001384

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