PHOTON-ENHANCED SURFACE DISSOCIATION EFFECTS IN LASER PHOTOLYSIS OF AMORPHOUS CARBON FROMCH2I2

Klaus Piglmayer (), Mikael Lindstam and Mats Boman
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Klaus Piglmayer: Johannes Kepler University Linz, Institute of Experimental Physics, Department of Applied Physics, A-4040 Linz, Austria
Mikael Lindstam: Uppsala University, Ångström Laboratory, Department of Inorganic Chemistry, Box 538, SE-75121 Uppsala, Sweden
Mats Boman: IfM, Louisiana Tech University, Ruston, LA 71271, USA

Surface Review and Letters (SRL), 2001, vol. 08, issue 06, 609-612

Abstract: With near-UVAr+-laser-induced photolysis of gaseousCH2I2, efficient, large-area or localized deposition of iodine-free amorphous carbon is possible at room temperature. The method allows a separate substrate heating and thereby a tuning of the deposits properties from soft and polymer-like to diamond-like. This article reports on an observed photon–surface interaction resulting in an enhanced carbon film formation. The shape of the deposit indicates that the deposition process is supported by an increased absorption cross section of surface-adsorbed intermediate molecular fragments, with respect to flat-angle surface-impinging photons.

Date: 2001
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DOI: 10.1142/S0218625X01001555

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