A SOFT X-RAY UNDULATOR BEAMLINE AT THE ADVANCED LIGHT SOURCE WITH CIRCULAR AND VARIABLE LINEAR POLARIZATION FOR THE SPECTROSCOPY AND MICROSCOPY OF MAGNETIC MATERIALS

Anthony T. Young, Elke Arenholz, Jun Feng, Howard Padmore, Steve Marks, Ross Schlueter, Egon Hoyer, Nicholas Kelez and Christoph Steier
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Anthony T. Young: Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA
Elke Arenholz: Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA
Jun Feng: Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA
Howard Padmore: Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA
Steve Marks: Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA
Ross Schlueter: Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA
Egon Hoyer: Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA
Nicholas Kelez: Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA
Christoph Steier: Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA

Surface Review and Letters (SRL), 2002, vol. 09, issue 01, 549-554

Abstract: A new undulator beamline at the Advanced Light Source, Lawrence Berkeley National Laboratory is described. This new beamline has an Apple II type undulator which produces linearly and elliptically polarized X-rays. A high resolution monochromator directs the radiation to two branchlines. The first branchline is optimized for spectroscopy and accommodates multiple endstations simultaneously. The second branchline features a photoemission electron microscope. A novel feature of the beamline is the ability to produce linearly polarized radiation at arbitrary, user-selectable angles. Applications of the new beamline are also described.

Date: 2002
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DOI: 10.1142/S0218625X02002622

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