A SIMPLE XUV SOURCE AT 13.5 NM BASED ON ABLATIVE CAPILLARY DISCHARGE

Željko Andreić (), Samir Shakir Ellwi (), Sanda Pleslić () and Hans-Joachim Kunze ()
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Željko Andreić: Division of Materials Research, Rudjer Bošković Institute, Bijenićka 54, pp 180, 10002 Zagreb, Croatia
Samir Shakir Ellwi: ASML, de Run 1110, 5503 LA Veldhoven, The Netherlands
Sanda Pleslić: Department of Applied Physics, Faculty of Electrical Engineering and Computing, University of Zagreb, Unska 3, 10000 Zagreb, Croatia
Hans-Joachim Kunze: Institut für Experimentalphysik V, Ruhr-Universität, 44780 Bochum, Germany

Surface Review and Letters (SRL), 2002, vol. 09, issue 01, 627-630

Abstract: A XUV source that produces a strong emission band at the wavelength of 13.5 nm with a FWHM of 0.6 nm and a duration of about 100 ns is described. In particular this wavelength has attracted the attention of many scientists working in the field by being a good candidate for the development of XUV lithography. The source was generated by using an ablative capillary discharge where the capillary was made of PVC (polyvinyl chloride). A remarkable burst of radiation at the above wavelength was recorded, the intensity of the radiation being higher by a factor of 10 in the spectral region of interest, as compared to usually used capillaries made of POM (polyacetal), or to recently developed capillary discharges in noble gases. Total XUV radiation energy of up to 50 mJ per pulse seems to be possible with such a device. Due to its simplicity, the described capillary discharge is a good candidate for a simple incoherent XUV source at 13.5 nm.

Date: 2002
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DOI: 10.1142/S0218625X02002920

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