SiL2,3EMISSION SPECTRA FROM THE INTERFACES IN ANTIFERROMAGNETICALLY COUPLED Fe/SiMULTILAYERS

Takashi Imazono, Noboru Miyata, Osamu Kitakami and Mihiro Yanagihara
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Takashi Imazono: Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
Noboru Miyata: Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
Osamu Kitakami: Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
Mihiro Yanagihara: Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan

Surface Review and Letters (SRL), 2002, vol. 09, issue 02, 669-673

Abstract: An Fe(3.0 nm)/Si(1.3 nm) multilayer had been found to exhibit a fairly strong antiferromagnetic coupling by Endoet al.However, the medium responsible for the interlayer coupling had not been assigned. We measured the SiL2,3emission spectra fromFe(3.0 nm)/Si(t)multilayers oft = 0.5, 1.0, 1.5, 2.0, and 4.0 nm thick. From the emission spectra the interface of the multilayers was found to consist of dominantlyFe3Sialloy. From a rough spectral analysis, there seems to remain a very thina-Siand/or high-resistive Fe–Si alloy layer sandwiched between theFe3Silayers, which is responsible for the strong interlayer coupling.

Date: 2002
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DOI: 10.1142/S0218625X02002828

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