SYNCHROTRON RADIATION PHOTOEMISSION AND INFRARED SPECTROSCOPY STUDY OF ADSORPTION AND DECOMPOSITION OF DICHLOROSILANE ONSi(100)(2 × 1)

Nozomu Kamakura, Masanori Shinohara, Hayato Watanabe, Takayuki Kuwano, Akio Seyama, Yasuo Kimura and Michio Niwano
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Nozomu Kamakura: Research Institute of Electrical Communication, Tohoku University, Sendai 980-77, Japan
Masanori Shinohara: Research Institute of Electrical Communication, Tohoku University, Sendai 980-77, Japan
Hayato Watanabe: Research Institute of Electrical Communication, Tohoku University, Sendai 980-77, Japan
Takayuki Kuwano: Research Institute of Electrical Communication, Tohoku University, Sendai 980-77, Japan
Akio Seyama: Research Institute of Electrical Communication, Tohoku University, Sendai 980-77, Japan
Yasuo Kimura: Research Institute of Electrical Communication, Tohoku University, Sendai 980-77, Japan
Michio Niwano: Research Institute of Electrical Communication, Tohoku University, Sendai 980-77, Japan

Surface Review and Letters (SRL), 2002, vol. 09, issue 02, 803-808

Abstract: We have used synchrotron radiation photoemission (SR-PES) and infrared absorption spectroscopy (IRAS) to investigatein situthe adsorption and decomposition ofSiH2Cl2onSi(100)(2 × 1). Si 2p core level photoemission spectra and IRAS spectra in the Si–H stretching vibration region of the surface exposed toSiH2Cl2at room temperature have been measured to elucidate howSiH2Cl2adsorbs on the surface. PES data show that monochloride (SiCl) and hydride species(SiHx)are generated upon dichlorosilane adsorption. IRAS data demonstrate that at initial stages ofSiH2Cl2adsorption, the monohydride, the dihydride(SiH2)and the Cl-substituted hydride (–SiHCl) are populated on the surface. Comparison of PES and IRAS data indicates that Si–Cl bonds of theSiH2Cl2molecule are readily ruptured upon adsorption of dichlorosilane on theSi(100)(2 × 1).

Date: 2002
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DOI: 10.1142/S0218625X02003019

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