MAGNETIC COUPLING IN Co/CuMULTILAYERS: FIELD-DEPENDENT ANTIFERROMAGNETIC ORDERING INVESTIGATED BY RESONANT X-RAY SCATTERING

Carlo Spezzani, Piero Torelli, Maurizio Sacchi, Renaud Delaunay, Coryn F. Hague, Alessandro Mirone, Fahrad Salmassi, Eric M. Gullikson and James H. Underwood
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Carlo Spezzani: Istituto Nazionale per la Fisica della Materia, Sezione di Modena, Via Campi 213/a, 41100 Modena, Italy;
Piero Torelli: Laboratoire pour l'Utilisation du Rayonnement Electromagnétique, B.P. 34, 91898 Orsay, France
Maurizio Sacchi: Laboratoire pour l'Utilisation du Rayonnement Electromagnétique, B.P. 34, 91898 Orsay, France
Renaud Delaunay: Laboratoire de Chimie-Physique-Matière et Rayonnement, 11 rue Pierre et Marie Curie, 75005 Paris, France
Coryn F. Hague: Laboratoire pour l'Utilisation du Rayonnement Electromagnétique, B.P. 34, 91898 Orsay, France;
Alessandro Mirone: European Synchrotron Radiation Facility, BP 220, 38042 Grenoble, France
Fahrad Salmassi: Center for X-ray Optics, Lawrence Berkeley Laboratory, Berkeley, CA 94720, USA
Eric M. Gullikson: Center for X-ray Optics, Lawrence Berkeley Laboratory, Berkeley, CA 94720, USA
James H. Underwood: Center for X-ray Optics, Lawrence Berkeley Laboratory, Berkeley, CA 94720, USA

Surface Review and Letters (SRL), 2002, vol. 09, issue 02, 921-924

Abstract: By simultaneous measurements of sample resistance and of X-ray resonant scattering, we tried to establish a direct correlation between magnetoresistance (MR) and antiferromagnetic (AF) order in a Co/Cu metallic multilayer. Field-dependent scattered intensity has been measured in a geometrical configuration corresponding to the Bragg peak coming from the AF coupling, at a photon energy close to the CoL3absorption edge(hν = 776.5eV). The comparison between measurements of the scattered intensity and of the resistance clearly shows a direct correlation between AF order and MR.

Date: 2002
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DOI: 10.1142/S0218625X02003214

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