DIRECT GROWTH OF EPITAXIALLa0.67Ca0.33MnO3 - δTHIN FILMS
G. Campillo,
L. F. Castro,
P. Vivas,
E. Baca (),
P. Prieto,
D. Arias,
J. Santamaría,
A. Berger and
S. D. Bader
Additional contact information
G. Campillo: Departamento de Física, Universidad del Valle, Cali, A. A. 25360, Colombia
L. F. Castro: Departamento de Física, Universidad del Valle, Cali, A. A. 25360, Colombia
P. Vivas: Departamento de Física, Universidad del Valle, Cali, A. A. 25360, Colombia
E. Baca: Departamento de Física, Universidad del Valle, Cali, A. A. 25360, Colombia
P. Prieto: Departamento de Física, Universidad del Valle, Cali, A. A. 25360, Colombia
D. Arias: GFMC, Departamento de Física Aplicada III, Universidad Complutense de Madrid, 28040, Madrid, Spain
J. Santamaría: GFMC, Departamento de Física Aplicada III, Universidad Complutense de Madrid, 28040, Madrid, Spain
A. Berger: Materials Science Division, Argonne National Laboratory, Argonne, IL 60439, USA
S. D. Bader: Materials Science Division, Argonne National Laboratory, Argonne, IL 60439, USA
Surface Review and Letters (SRL), 2002, vol. 09, issue 05n06, 1611-1615
Abstract:
La0.67Ca0.33MnO3 - δthin films were deposited using a high-pressure dc-sputtering process. Pure oxygen at a pressure of 3.8 mbar was used as sputtering gas. The films were grown on (001)LaAlO3and (001)SrTiO3substrates at heater temperature of 850° without any annealing treatment. The formation of highlya-axis-oriented films with sharp interface with substrate surface is demonstrated by X-ray diffraction, transmission electron microscope (TEM), and atomic force microscope (AFM) analysis. Electrical characterization revealed a metal–insulator transition atTMI= 276K, and magnetic characterization showed good magnetic properties with a PM–FM transition atTC≈ 262K.
Keywords: 81.10.F; 75.70.P; 81.40 (search for similar items in EconPapers)
Date: 2002
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DOI: 10.1142/S0218625X02004086
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