MEASUREMENT OF CRITICAL EXPONENTS OF PLATINUM THIN FILMS

M. C. Salvadori, L. L. Melo, M. Cattani, O. R. Monteiro and I. G. Brown
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M. C. Salvadori: Instituto de Física, Universidade de São Paulo, CP 66318, CEP 05315-970, São Paulo, SP, Brazil
L. L. Melo: Instituto de Física, Universidade de São Paulo, CP 66318, CEP 05315-970, São Paulo, SP, Brazil
M. Cattani: Instituto de Física, Universidade de São Paulo, CP 66318, CEP 05315-970, São Paulo, SP, Brazil
O. R. Monteiro: Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA
I. G. Brown: Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA

Surface Review and Letters (SRL), 2003, vol. 10, issue 01, 1-5

Abstract: We have fabricated platinum thin films by metal plasma ion deposition on silicon substrates. The roughness of these films has been measured by a scanning tunneling microscope (STM) and we have determined the growth dynamics critical exponents.

Keywords: Platinum thin films; critical exponents (search for similar items in EconPapers)
Date: 2003
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Citations: View citations in EconPapers (1)

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DOI: 10.1142/S0218625X03004561

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