Friction Force Microscopy Study of the Hydrophilicity of TiO2Thin Films Deposited by Radio Frequency Magnetron Sputtering

L. Sirghi (), T. Aoki and Y. Hatanaka
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L. Sirghi: Research Institute of Electronics, Shizuoka University, 3-5-1 Johoku, Hamamatsu 432-8011, Japan
T. Aoki: Research Institute of Electronics, Shizuoka University, 3-5-1 Johoku, Hamamatsu 432-8011, Japan
Y. Hatanaka: Research Institute of Electronics, Shizuoka University, 3-5-1 Johoku, Hamamatsu 432-8011, Japan

Surface Review and Letters (SRL), 2003, vol. 10, issue 02n03, 345-349

Abstract: Atomic force microscopy (AFM) measurements of the tip–sample friction and adhesive forces were used to study the chemical homogeneity of the surface of titanium dioxide thin films deposited by radio frequency magnetron sputtering deposition. As a result of the photocatalytic activity, the film surface turned superhydrophilic by UV light irradiation in air. However, the AFM measurements showed that the surface of titanium dioxide deposited at low gas pressure (1 mTorr) was chemically heterogeneous with grains of very low photocatalytic activity. In the ambient air, due to the capillary condensation of the water vapor at the AFM tip–sample contact, the superhydrophilic regions on the film surface show larger friction and adhesive forces compared to the regions of low hydrophilicity.

Date: 2003
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DOI: 10.1142/S0218625X03005141

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