Structure of Nanoparticles of Aluminum and Silicon Nitrides Produced by RF Plasma

Takeshi Sato, Chihiro Kaito and Yoshio Saito
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Takeshi Sato: Department of Nanophysics in Frontier Project, Ritsumeikan University, Shiga 525-8577, Japan
Chihiro Kaito: Department of Nanophysics in Frontier Project, Ritsumeikan University, Shiga 525-8577, Japan
Yoshio Saito: Department of Electron and Information Science, Kyoto Institute of Technology, Kyoto 606-8585, Japan

Surface Review and Letters (SRL), 2003, vol. 10, issue 02n03, 435-442

Abstract: AlN and Si3N4particles with sizes of the order of 50 nm were produced by passing Al and Si smoke particles of the order of 50 nm in size through a plasma field. The resulting particles showed the characteristic crystal structure of a nitride. When Al and Si particles were produced in a mixture gas of N2and Ar without plasma, the particles produced were covered with an amorphous nitride layer composed of microcrystallites. Since the flow rate of metallic particles in the plasma region is of the order of 1 m/s, the present particles changed into nitride particles instantaneously.

Keywords: AlN particle; Si3N4particle; electron microscopy (search for similar items in EconPapers)
Date: 2003
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DOI: 10.1142/S0218625X03005293

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