Micropatterning by Wettability Control of theSiO2Surface with Ultraviolet Irradiation

Lan Huang, Yu Zhang, Jianhui Liao, Lina Xu, Ning Gu and Haojing Shen
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Lan Huang: National Laboratory of Biomolecular and Molecular Electronics, Research Center for Nano-scale Science and Technology, Southeast University, Nanjing, 210096, China
Yu Zhang: National Laboratory of Biomolecular and Molecular Electronics, Research Center for Nano-scale Science and Technology, Southeast University, Nanjing, 210096, China
Jianhui Liao: National Laboratory of Biomolecular and Molecular Electronics, Research Center for Nano-scale Science and Technology, Southeast University, Nanjing, 210096, China
Lina Xu: National Laboratory of Biomolecular and Molecular Electronics, Research Center for Nano-scale Science and Technology, Southeast University, Nanjing, 210096, China
Ning Gu: National Laboratory of Biomolecular and Molecular Electronics, Research Center for Nano-scale Science and Technology, Southeast University, Nanjing, 210096, China
Haojing Shen: Institute of Electron Device, Nanjing, 210016, China

Surface Review and Letters (SRL), 2003, vol. 10, issue 04, 569-570

Abstract: A new phenomenon has been described for fabrication micropatterning by changingSiO2surface wettability with ultraviolet irradiation. The most possible reason is the elimination of surface oxygen vacancies at bridging sites. With this technique reconstructed, it may be applicable to assembly of microelectronic circuits in the future.

Keywords: Micropattern; ultraviolet irradiation; assembly (search for similar items in EconPapers)
Date: 2003
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DOI: 10.1142/S0218625X03005414

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