Study of Improvement Technology of Photocatalytic Activity on theTiO2Sol by Plasma Treatment After Dip-Coating Processing

C.-K. Jung (), S.-H. Cho, S.-B. Lee, T.-K. Kim, M.-N. Lee and J.-H. Boo ()
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C.-K. Jung: Department of Chemistry and Institute of Basic Science, Sungkyunkwan University, Suwon 440-746, Korea
S.-H. Cho: Department of Chemistry and Institute of Basic Science, Sungkyunkwan University, Suwon 440-746, Korea
S.-B. Lee: Department of Chemistry and Institute of Basic Science, Sungkyunkwan University, Suwon 440-746, Korea
T.-K. Kim: Department of Chemistry and Institute of Basic Science, Sungkyunkwan University, Suwon 440-746, Korea;
M.-N. Lee: Department of Chemistry and Institute of Basic Science, Sungkyunkwan University, Suwon 440-746, Korea;
J.-H. Boo: Department of Chemistry and Institute of Basic Science, Sungkyunkwan University, Suwon 440-746, Korea

Surface Review and Letters (SRL), 2003, vol. 10, issue 04, 635-640

Abstract: We have deposited titanium dioxideTiO2thin films on glass using a single molecular precursor such as titanium (IV) isopropoxide(Ti[OCH(CH3)2]4, 97%)by sol–gel processing. Argon and oxygen rf plasma treatments at 295 K for 0.5 h in the power range of 50–200 W were also used to elevate photocatalytic activity of the as-grownTiO2films. A superhydrophilic property and surface morphology change appeared in the light irradiation withO2plasma treatment. In this work, the effect of the plasma with photocatalyst (TiO2) on the improvement of hydrophilic properties has mainly been investigated. Photocatalytic activity was evaluated by measurements of the uv/vis. irradiation, refractive index, contact angle, and AFM analysis. We confirmed that plasma treatment is a very reliable method for the synthesis ofTiO2thin films with high catalytic performance.

Keywords: TiO2films; dip-coating; TiO2precursor sol; plasma treatment; photocatalytic activity (search for similar items in EconPapers)
Date: 2003
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DOI: 10.1142/S0218625X03005499

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