MEASUREMENT OF CRITICAL EXPONENTS OF NANOSTRUCTURED GOLD THIN FILMS

L. L. Melo, M. C. Salvadori and M. Cattani ()
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L. L. Melo: Instituto de Física, Universidade de São Paulo, CP 66318, CEP 05315-970, São Paulo, SP, Brazil
M. C. Salvadori: Instituto de Física, Universidade de São Paulo, CP 66318, CEP 05315-970, São Paulo, SP, Brazil
M. Cattani: Instituto de Física, Universidade de São Paulo, CP 66318, CEP 05315-970, São Paulo, SP, Brazil

Surface Review and Letters (SRL), 2003, vol. 10, issue 06, 903-908

Abstract: We have fabricated gold thin films by metal plasma ion deposition on silicon substrates. The roughness of these nanostructured films has been measured by scanning tunneling microscopy (STM) and we have determined the growth dynamics critical exponents. We have also measured the grain sizes as a function of the film thickness.

Keywords: Gold thin films; critical exponents (search for similar items in EconPapers)
Date: 2003
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DOI: 10.1142/S0218625X03005694

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