ELECTRICAL CONDUCTION THROUGH SURFACE SUPERSTRUCTURES MEASURED BY MICROSCOPIC FOUR-POINT PROBES

Shuji Hasegawa, Ichiro Shiraki, Fuhito Tanabe, Rei Hobara, Taizo Kanagawa, Takehiro Tanikawa, Iwao Matsuda, Christian L. Petersen, Torben M. Hansen, Peter Boggild and Francois Grey
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Shuji Hasegawa: Department of Physics, University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-0033, Japan
Ichiro Shiraki: Department of Physics, University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-0033, Japan
Fuhito Tanabe: Department of Physics, University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-0033, Japan
Rei Hobara: Department of Physics, University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-0033, Japan
Taizo Kanagawa: Department of Physics, University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-0033, Japan
Takehiro Tanikawa: Department of Physics, University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-0033, Japan
Iwao Matsuda: Department of Physics, University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-0033, Japan
Christian L. Petersen: Capres A/S, DTU Bldg. 404 east, DK-2800, Lyngby, Denmark
Torben M. Hansen: Microelectronics Center, Denmark Technical University, Bldg. 345 east, DK-2800, Lyngby, Denmark
Peter Boggild: Microelectronics Center, Denmark Technical University, Bldg. 345 east, DK-2800, Lyngby, Denmark
Francois Grey: Microelectronics Center, Denmark Technical University, Bldg. 345 east, DK-2800, Lyngby, Denmark

Surface Review and Letters (SRL), 2003, vol. 10, issue 06, 963-980

Abstract: Forin-situmeasurements of the local electrical conductivity of well-defined crystal surfaces in ultrahigh vacuum, we have developed two kinds of microscopic four-point probe methods. One involves a "four-tip STM prober," in which four independently driven tips of a scanning tunneling microscope (STM) are used for measurements of four-point probe conductivity. The probe spacing can be changed from 500 nm to 1 mm. The other method involves monolithic micro-four-point probes, fabricated on silicon chips, whose probe spacing is fixed around several μm. These probes are installed in scanning-electron-microscopy/electron-diffraction chambers, in which the structures of sample surfaces and probe positions are observedin situ. The probes can be positioned precisely on aimed areas on the sample with the aid of piezoactuators. By the use of these machines, the surface sensitivity in conductivity measurements has been greatly enhanced compared with the macroscopic four-point probe method. Then the conduction through the topmost atomic layers (surface-state conductivity) and the influence of atomic steps on conductivity can be directly measured.

Keywords: Four-point probe conductivity measurement; surface-state conductivity; scanning tunneling microscopy; scanning electron microscopy (search for similar items in EconPapers)
Date: 2003
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DOI: 10.1142/S0218625X03005736

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