ELECTRICAL RESISTIVITY OF NANOSTRUCTURED PLATINUM AND GOLD THIN FILMS

M. C. Salvadori (), A. R. Vaz, R. J. C. Farias and M. Cattani
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M. C. Salvadori: Institute of Physics, University of São Paulo, CP 66318, CEP 05315-970, São Paulo, SP, Brazil
A. R. Vaz: Institute of Physics, University of São Paulo, CP 66318, CEP 05315-970, São Paulo, SP, Brazil
R. J. C. Farias: Institute of Physics, University of São Paulo, CP 66318, CEP 05315-970, São Paulo, SP, Brazil
M. Cattani: Institute of Physics, University of São Paulo, CP 66318, CEP 05315-970, São Paulo, SP, Brazil

Surface Review and Letters (SRL), 2004, vol. 11, issue 02, 223-227

Abstract: We have measured, at room temperature, the resistivity, the surface roughness and the lateral surface correlation lengths of nanostructured platinum and gold thin films. The films' thicknessd, deposited by vacuum arc plasma, is in the range1.31≤d≤11.66nm for platinum and1.77≤d≤10.46nm for gold. A theoretical estimate of our experimental data has been made.

Keywords: Electrical resistivity of metallic thin films; nanostructured thin films (search for similar items in EconPapers)
Date: 2004
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DOI: 10.1142/S0218625X04006086

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