THE DEVELOPMENT OF NICKEL ULTRA-THIN FILMS AND THE INTERACTION WITH OXYGEN ON THESrTiO3(100)SURFACE STUDIED BY SOFT X-RAYS PHOTOELECTRON SPECTROSCOPY

M. Kamaratos, D. Vlachos (), S. D. Foulias and Ch. Argirusis
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M. Kamaratos: Department of Physics, University of Ioannina, 451 10 Ioannina, Greece
D. Vlachos: Department of Physics, University of Ioannina, 451 10 Ioannina, Greece
S. D. Foulias: Department of Physics, University of Ioannina, 451 10 Ioannina, Greece
Ch. Argirusis: TU Clausthal, Institut für Metallurgie, AG Thermochemie und Mikrokinetik, Robert-Koch-Str. 42, D-38678 Clausthal-Zellerfeld, Germany

Surface Review and Letters (SRL), 2004, vol. 11, issue 04n05, 419-425

Abstract: The electronic properties of very thinNifilms on theSrTiO3(100)-Fedoped surfaces and their interaction with oxygen have been studied by soft X-rays photoelectron spectroscopy measurements. Nickel starts to become metallic on the surface in the very early adsorption stages. Oxygen adsorption on the nickel coveredSrTiO3(100)surface leads gradually to an almost complete oxidation of the nickel overlayer. The oxidation seems to take place through two different oxidation states, which according to the literature are due to theNi2+andNi3+species. The heating of theO/Ni/SrTiO3system at 850 K, causes a partial reduction of the nickel overlayer.

Keywords: Nickel; strodium titanate; oxygen; nickel oxide; adsorption; soft X-ray photoelectron spectroscopy (search for similar items in EconPapers)
Date: 2004
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DOI: 10.1142/S0218625X04006402

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