GROWTH, MORPHOLOGICAL AND STRUCTURAL PROPERTIES OFAgTHIN FILMS ON ARu(0001)SURFACE GROWN BY MBE

A. Azizi (), J. Arabski and A. Dinia
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A. Azizi: Laboratoire d'Energétique et d'Electrochimie du Solide, Université de Sétif, 19000, Algérie
J. Arabski: Institut de Physique et Chimie des Matériaux de Strasbourg (UMR 7504 du CNRS), 23 rue du Loess, BP 43, F-67034 Strasbourg, France
A. Dinia: Institut de Physique et Chimie des Matériaux de Strasbourg (UMR 7504 du CNRS), 23 rue du Loess, BP 43, F-67034 Strasbourg, France

Surface Review and Letters (SRL), 2004, vol. 11, issue 06, 563-568

Abstract: Agthin films deposited onRu(0001)surface by molecular beam epitaxy, at temperatures of 20°C and 450°C, have been investigated using reflection high-energy electron diffraction (RHEED), atomic force microscopy (AFM) and X-ray diffraction (XRD) techniques. For both growth temperatures, thein situRHEED patterns of theAgfilms exhibited an in-plane six-fold symmetry, indicating that theAgdeposit is in epitaxy with theRubuffer surface. At RT, the RHEED technique indicated a three-dimensional growth (3D), while a layer-by-layer growth (2D) takes place at HT. The AFM images showed a granular structure of the surface of the depositedAglayers with a large variation of the roughness with the growth temperature. XRD analysis gave indication of a strongly textured thin film along the growth direction. The lattice mismatch between theAgandRuis at the origin of a stress at the interface and defects structure in the film.

Keywords: Silver; thin films; MBE; RHEED; XRD; 81.15 Hi; 81.10 Aj; 61.14 Hg (search for similar items in EconPapers)
Date: 2004
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DOI: 10.1142/S0218625X04006517

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