EFFECT OF BORON WEIGHT PERCENTAGES IN THE TARGET OF PULSED LASER DEPOSITION ON THE PREPARATION OF BORON-DOPED AMORPHOUS CARBON FILMS

M. Rusop (), T. Kinugawa, T. Soga and T. Jimbo
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M. Rusop: Department of Environmental Technology and Urban Planning, Nagoya Institute of Technology Gokiso-Cho, Showa-Ku, Nagoya 466-8555, Japan
T. Kinugawa: Department of Environmental Technology and Urban Planning, Nagoya Institute of Technology Gokiso-Cho, Showa-Ku, Nagoya 466-8555, Japan
T. Soga: Department of Environmental Technology and Urban Planning, Nagoya Institute of Technology Gokiso-Cho, Showa-Ku, Nagoya 466-8555, Japan
T. Jimbo: Department of Environmental Technology and Urban Planning, Nagoya Institute of Technology Gokiso-Cho, Showa-Ku, Nagoya 466-8555, Japan

Surface Review and Letters (SRL), 2005, vol. 12, issue 01, 27-34

Abstract: The effect of boron weight percentage in the camphoric carbon target of pulsed laser deposition on the preparation of boron-doped amorphous carbon (a-C:B) films has been studied using standard measurement techniques. XPS results showed the a-C:B films bonding properties almost unchanged at lower Bwt% up to 10 Bwt%, after which it changes with the increase of Bwt%, indicating increasing doping concentration with increase of Bwt% in the target. This phenomenon is further supported by FTIR and Visible-Raman spectroscopy analyses. The variation of bonding and structural properties are also correlated with the optical gap(Eg)and electrical resistivity (ρ) characteristics which are related to successful doping of B for low content of B in the amorphous carbon (a-C) films as the bonding, structural andEgremain almost unchanged, and the ρ decreased untill the film deposited at 10 Bwt%. Since both theEgand ρ decrease sharply with higher Bwt%, this phenomenon can be related to the graphitization.

Keywords: Camphor; boron; doping; target; Pld; XPS; FTIR; electrical properties (search for similar items in EconPapers)
Date: 2005
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DOI: 10.1142/S0218625X05006767

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