SYNTHESIS AND PROPERTY STUDY OF NANOPARTICLE QUATERNARY SEMICONDUCTORSiCAlNFILMS WITH CO-SPUTTERING UNDER LOWER TEMPERATURE

Shiyong Huang, S. Xu, Jidong Long, Zhenhong Dai and Yuanping Sun
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Shiyong Huang: Physics Department of Yantai University, Yantai, 264005, P. R. China;
S. Xu: Plasma Source and Application Center, NIE, Nanyang Technological University, 1 Nanyang Walk, Singapore 637616, Singapore
Jidong Long: Plasma Source and Application Center, NIE, Nanyang Technological University, 1 Nanyang Walk, Singapore 637616, Singapore
Zhenhong Dai: Physics Department of Yantai University, Yantai, 264005, P. R. China
Yuanping Sun: Physics Department of Yantai University, Yantai, 264005, P. R. China

Surface Review and Letters (SRL), 2005, vol. 12, issue 03, 397-400

Abstract: QuaternarySiCAlNnanoparticle films were produced by reactive rf magnetron co-sputtering technique with a chemically pureSiCand anAltarget under low temperature. The crystalline structure, surface morphology, and element content of the films were studied in terms of sputtering parameters. The element content and chemical states ofSiCAlNfilms were measured by means of energy dispersive X-ray fluorescence (EDX) and X-ray photoelectronic spectroscopy (XPS). Surface morphology ofSiCAlNfilms was investigated by FE-SEM.

Keywords: Nanoparticle film; co-sputtering; surface morphology; low temperature (search for similar items in EconPapers)
Date: 2005
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DOI: 10.1142/S0218625X05007153

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