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EFFECT OF ANNEALING TEMPERATURE ON THE OPTICAL AND STRUCTURAL PROPERTIES OF DIP-COATEDAl2O3THIN FILMS PREPARED BY SOL–GEL ROUTE

F. E. Ghodsi (), M. Mafakheri and A. Novinrooz
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F. E. Ghodsi: Department of Physics, Faculty of Science, The University of Guilan, Namjoo Ave., P. O. Box: 41335-1914, Rasht, Iran
M. Mafakheri: Department of Physics, Faculty of Science, The University of Guilan, Namjoo Ave., P. O. Box: 41335-1914, Rasht, Iran
A. Novinrooz: Ion Beam Application Department, AEOI-NRCAM, P. O. Box: 31585-4395, Karaj, Iran

Surface Review and Letters (SRL), 2005, vol. 12, issue 05n06, 793-797

Abstract: Thin films ofAl2O3were prepared by the sol–gel process. Dip-coating technique was used for deposition of theAl2O3thin films onto glass substrates. Optical and structural properties of the films were investigated with respect to the annealing temperature (100–500°C). The structure of these films was determined by X-ray diffraction (XRD). Scanning electron microscopy (SEM) was performed for the analysis of surface morphology. For determination of the optical constants ofAl2O3thin films, UV-Visible spectrophotometry measurements were carried out. Annealing temperature affects the structural and optical properties of theAl2O3thin films. The refractive index and extinction coefficient of the films at 550 nm wavelength increase from 1.56 to 1.66, and from3.41 × 10-5to5.54 × 10-5, respectively while optical band gap and thickness of the films decrease from 4.15 eV to 4.11 eV, and 360 nm to 260 nm, respectively, by increasing annealing temperature from 100°C to 500°C.

Keywords: Aluminum oxide; sol–gel; thin films; optical constants (search for similar items in EconPapers)
Date: 2005
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DOI: 10.1142/S0218625X05007979

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