CHARACTERIZATION OF SURFACE PROPERTIES AND MICROSTRUCTURE OF PVD-TiNFILMS USING MEVVA ION IMPLANTATION

J. H. Yang (), M. F. Cheng, X. D. Luo and T. H. Zhang
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J. H. Yang: School of Science, Nantong University, Jiangsu 226007, P. R. China;
M. F. Cheng: School of Science, Nantong University, Jiangsu 226007, P. R. China
X. D. Luo: School of Science, Nantong University, Jiangsu 226007, P. R. China
T. H. Zhang: Radiation Beam and Materials Engineering Laboratory, Beijing Normal University, Beijing 100875, P. R. China

Surface Review and Letters (SRL), 2006, vol. 13, issue 04, 519-524

Abstract: The PVD-TiNfilm was implanted with titanium ions and the improvement in surface wear resistance was investigated.Tiion implantation was done using a metal vapor vacuum arc (MEVVA) ion source with an implantation dose of 2 × 1016ions/cm2and at an extraction voltage of 48 kV. The wear characteristics of the implanted zone was measured and compared to the performance of the unimplanted zone by a pin-on-disc apparatus and an optical interference microscope. The structure of the implanted zone and unimplanted one was observed by X-ray photoelectron spectroscopy (XPS) and transmission electron microscopy (TEM). A dynamic TRIM called TRIDYN was used to calculate the concentration depth profile of implantedTiinTiNto investigate the profile of multi-charge state ions. The results showed that the improved wear resistance of theTiNfilm was mainly due to the presence of nano-orderTiNcrystal grains afterTiion implantation.

Keywords: TiN; ion implantation; wear resistance; XPS; TEM; TRIDYN (search for similar items in EconPapers)
Date: 2006
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DOI: 10.1142/S0218625X06008463

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