SURFACE TEMPERATURE FIELD MODEL AND INFLUENCE FACTORS OF HF CVD DIAMOND FILMS ONWC–CoALLOYS

Sha Liu and Jing Qiu Zhang
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Sha Liu: School of Materials Science and Engineering, Central South University, Changsha, Hunan 410083, P. R. China
Jing Qiu Zhang: College of Information Science and Engineering, Central South University, Changsha, Hunan 410083, P. R. China

Surface Review and Letters (SRL), 2006, vol. 13, issue 05, 661-668

Abstract: The surface temperature field model of hot filament chemical vapor deposition (HF CVD) diamond films onWC–Coalloys was constructed and calculated by taking into account the influences of both thermal source properties and physical properties of substrates. Under the certain conditions of some parameters, the effects of the influence factors such as the maximum specific heat flux(qm), the heat conductivity coefficient (λ) of the substrate and the substrate height(h)on the surface temperature field were exhibited quickly and clearly by the computer modeling. The theoretical calculating data are close to the experimental results. It is found that the influences of the thermal source parameter, the substrate height, and the heat conductivity coefficient of the substrate materials on the surface temperature field of diamond films onWC–Coalloys are almost equally important.

Keywords: Temperature field model; HF CVD; diamond film; WC–Coalloy (search for similar items in EconPapers)
Date: 2006
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DOI: 10.1142/S0218625X06008621

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