EFFECTS OF TECHNICAL PARAMETERS ON THE PULSED LASER DEPOSITED FERROELECTRIC FILMS

Yafan Zhao, Chuanzhong Chen (), Mingda Song, Jie Ma and Diangang Wang
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Yafan Zhao: School of Materials Science and Engineering, Shandong University, Ji'nan 250061, P. R. China;
Chuanzhong Chen: School of Materials Science and Engineering, Shandong University, Ji'nan 250061, P. R. China
Mingda Song: School of Mechanical Engineering, Shandong University, Ji'nan 250061, P. R. China
Jie Ma: School of Materials Science and Engineering, Shandong University, Ji'nan 250061, P. R. China
Diangang Wang: School of Materials Science and Engineering, Shandong University, Ji'nan 250061, P. R. China

Surface Review and Letters (SRL), 2006, vol. 13, issue 05, 687-695

Abstract: Pulsed laser deposition (PLD), which is a novel technique in producing thin films in the recent years, shows unique advantages for the deposition of ferroelectric films. Effects of technical parameters on the pulsed laser deposited ferroelectric films, including substrate temperature, oxygen pressure, post-annealing, buffer layer, target composition, energy density, wavelength, target-to-substrate distance, and laser pulse rate, are systematically reviewed in order to optimize these parameters. Processing-microstructure-property relationships of ferroelectric films by PLD are discussed. The application prospect is pointed as well.

Keywords: Ferroelectric film; pulsed laser deposition; parameters (search for similar items in EconPapers)
Date: 2006
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DOI: 10.1142/S0218625X06008669

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