A DC PLASMA DISCHARGE SOURCE AND ITS APPLICATION TO SYNTHESIS OF CARBON AND CARBON NITRIDE THIN FILMS

B. Q. Yang and P. X. Feng ()
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B. Q. Yang: Physics Department, University of Puerto Rico, Rio Piedras, San Juan, PR 00931, China
P. X. Feng: Physics Department, University of Puerto Rico, Rio Piedras, San Juan, PR 00931, China

Surface Review and Letters (SRL), 2007, vol. 14, issue 02, 309-314

Abstract: In the present work, a novel DC glow discharge source with configurations of hollow cathode electrodes had been developed. Discharge properties of the plasma source had been characterized. Experimental data indicated that the discharge current of the plasma source increased with the discharge voltage. The phase change of the discharge was observed with the increase of gas pressures. After characterization, the hollow cathode electrodes was used to sputtering deposition of both carbon and carbon nitride films.All samples were characterized by using Raman scattering spectroscopy. Typical D- and G-bands in the Raman spectrum of the samples were identified. In the case of carbon nitride films, the intensity ratio of D- and G-bands changed greatly with the deposition period of time. The shifts of D- and G-ands were also observed. In the case of carbon films, the intensity ratio of D- and G-bands slightly increased with an increase of the helium gas pressure from 100 to 200 Pa. The peak positions of the bands remained nearly unchanged with the variation of the helium gas pressure.

Keywords: Plasma discharge; sputtering deposition; thin films; Raman scattering (search for similar items in EconPapers)
Date: 2007
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DOI: 10.1142/S0218625X07009402

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