FORMATION AND FIELD EMISSION CHARACTERISTICS OF AMORPHOUS AND CRYSTALLINESiNANOARRAYS

J. Xu (), W. Li, J. Zhou, L. Xu, Z. H. Cen, K. J. Chen, F. Q. Song, J. G. Wan and M. Han
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J. Xu: National Laboratory of Solid State Microstructures and Department of Physics, Nanjing University, Nanjing 210093, China
W. Li: National Laboratory of Solid State Microstructures and Department of Physics, Nanjing University, Nanjing 210093, China
J. Zhou: National Laboratory of Solid State Microstructures and Department of Physics, Nanjing University, Nanjing 210093, China
L. Xu: National Laboratory of Solid State Microstructures and Department of Physics, Nanjing University, Nanjing 210093, China
Z. H. Cen: National Laboratory of Solid State Microstructures and Department of Physics, Nanjing University, Nanjing 210093, China
K. J. Chen: National Laboratory of Solid State Microstructures and Department of Physics, Nanjing University, Nanjing 210093, China
F. Q. Song: National Laboratory of Solid State Microstructures and Department of Physics, Nanjing University, Nanjing 210093, China
J. G. Wan: National Laboratory of Solid State Microstructures and Department of Physics, Nanjing University, Nanjing 210093, China
M. Han: National Laboratory of Solid State Microstructures and Department of Physics, Nanjing University, Nanjing 210093, China

Surface Review and Letters (SRL), 2007, vol. 14, issue 04, 543-546

Abstract: Highly ordered crystalline and amorphousSinanoarrays have been formed by using self-assembled monolayer of polystyrene nanospheres as a template followed by dry ion etching treatments. The template was removed by annealing at 8°C and pattern transfer process was revealed by atomic force microscopy. It was shown that the orderedSinanotips with a height about 70–80 nm and an average lateral size around 150 nm can be obtained. Field emission with low threshold electric field (

Keywords: Si; field emission; nanoarray (search for similar items in EconPapers)
Date: 2007
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DOI: 10.1142/S0218625X07009815

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