OPTICAL WAVEGUIDE FABRICATION AND REFRACTIVE INDEX CHARACTERIZATION OFNd:LuVO4THIN FILMS BY PULSED LASER DEPOSITION

Hongxia Li (), Xin Wu, Renguo Song and Jiyang Wang
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Hongxia Li: The MOE Key Laboratory of Mechanical Manufacture and Automation, Zhejiang University of Technology, Hangzhou 310014, China
Xin Wu: School of Mechanical Engineering, Hangzhou Dianzi University, Hangzhou 310018, China
Renguo Song: The MOE Key Laboratory of Mechanical Manufacture and Automation, Zhejiang University of Technology, Hangzhou 310014, China
Jiyang Wang: State Key Laboratory of Crystal Growth, Shandong University, Jinan 250100, China

Surface Review and Letters (SRL), 2007, vol. 14, issue 06, 1079-1082

Abstract: High-qualityNd:LuVO4thin films have been grown on silica glass substrates by using a pulsed laser deposition technique. X-ray diffraction results show that the as-depositedNd:LuVO4film is basically oriented polycrystalline, and strong (200) peak was revealed. The waveguide property was characterized by the prism-coupling method. The refractive index of the propagation mode is higher than that of the silica glass substrate which means that the dips correspond to real propagation mode, where the light could be well defined. The surface morphology of the depositedNd:LuVO4films was also observed by using an atomic force microscopy.

Keywords: Pulsed laser deposition; thin films; atomic force microscopy; X-ray technique; 81.15.Fg; 42.79.Gn; 42.82.Et; 68.55.-a (search for similar items in EconPapers)
Date: 2007
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DOI: 10.1142/S0218625X07010652

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