PREPARINGNi–WALLOY FILMS WITH LOW INTERNAL STRESS AND HIGH HARDNESS BY HEAT TREATING
Rui Liu,
Hong Wang,
Jin-Yuan Yao,
Xue-Ping Li and
Gui-Fu Ding
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Rui Liu: Key Laboratory for Thin Film and Microfabrication Technology of Ministry of Education, National Key Laboratory of Micro/Nano Fabrication Technology, Research Institute of Micro/Nano Science and Technology, Shanghai Jiao Tong University, Shanghai 200030, China
Hong Wang: Key Laboratory for Thin Film and Microfabrication Technology of Ministry of Education, National Key Laboratory of Micro/Nano Fabrication Technology, Research Institute of Micro/Nano Science and Technology, Shanghai Jiao Tong University, Shanghai 200030, China
Jin-Yuan Yao: Key Laboratory for Thin Film and Microfabrication Technology of Ministry of Education, National Key Laboratory of Micro/Nano Fabrication Technology, Research Institute of Micro/Nano Science and Technology, Shanghai Jiao Tong University, Shanghai 200030, China
Xue-Ping Li: Key Laboratory for Thin Film and Microfabrication Technology of Ministry of Education, National Key Laboratory of Micro/Nano Fabrication Technology, Research Institute of Micro/Nano Science and Technology, Shanghai Jiao Tong University, Shanghai 200030, China
Gui-Fu Ding: Key Laboratory for Thin Film and Microfabrication Technology of Ministry of Education, National Key Laboratory of Micro/Nano Fabrication Technology, Research Institute of Micro/Nano Science and Technology, Shanghai Jiao Tong University, Shanghai 200030, China
Surface Review and Letters (SRL), 2007, vol. 14, issue 06, 1107-1112
Abstract:
In this paper, the internal stress and hardness ofNi–Walloy films withWcontents in the range of 0–59 wt% were investigated. The amorphousNi–Walloy films were electrodeposited with 59 wt%Wcontent and the structure of crystalline alloy films was formed after heat treating. The experimental results showed that heat treating could prepareNi–Walloy films with lower internal stress compared with lowWcontent alloy films, and the heat treated alloy films still have high hardness. The internal stress and the hardness were about 230 MPa and 1000 Hv, respectively, when the heat treating temperature was 550°C. The relation of internal stress and hardness with the structure of alloy films is discussed.
Keywords: Ni–Walloys; internal stress; heat treating (search for similar items in EconPapers)
Date: 2007
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DOI: 10.1142/S0218625X07010676
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