MACRODROPLET REDUCTION AND GROWTH MECHANISMS IN CATHODIC ARC PHYSICAL VAPOR DEPOSITION OFTiNFILMS

Mubarak Ali (), Esah Hamzah (), Tahir Abbas (), Mohd Radzi Hj. Mohd Toff () and Ishtiaq A. Qazi ()
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Mubarak Ali: Department of Physics, COMSATS Institute of Information Technology (CIIT), Park Road, Islamabad, Pakistan
Esah Hamzah: Faculty of Mechanical Engineering, Universiti Teknologi Malaysia, 81310, Skudai, Johor, Malaysia
Tahir Abbas: Department of Physics, Bahauddin Zakariya University, Multan, 60800, Pakistan
Mohd Radzi Hj. Mohd Toff: Advanced Materials Research Center (AMREC), SIRIM Berhad, Kulim Hi-Tech Park, 09000 Kulim, Kedah, Malaysia
Ishtiaq A. Qazi: National University of Sciences and Technology, Tamiz-ud-din Road, Rawalpindi, Pakistan

Surface Review and Letters (SRL), 2008, vol. 15, issue 05, 653-659

Abstract: Cathodic arc physical vapor deposition (CAPVD) a technique used for the deposition of hard coatings for tooling applications has many advantages. The main drawback of this technique is the formation of macrodroplets (MDs) during deposition resulting in films with rougher morphology. The MDs contamination and growth mechanisms was investigated inTiNcoatings over high-speed steel, as a function of metal ion etching, substrate bias, and nitrogen gas flow rate; it was observed that the latter is the most important factor in controlling the size and number of the macrodroplets.

Keywords: Cathodic arc; PVD; TiN; macrodroplets; morphology; surface roughness (search for similar items in EconPapers)
Date: 2008
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DOI: 10.1142/S0218625X08011810

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