ENHANCED LIGHT EXTRACTION FROM COLLOIDALZnOQD FILM BY ADDING ON PHOTONIC CRYSTALS USING UV-NANOIMPRINT LITHOGRAPHY

Xiali Li (), Guangqian Yang, Jian Chen, Rongjun Zhang, Weimin Zhou, Yanbo Liu, Jing Zhang and Qingkang Wang
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Xiali Li: Research Institute of Micro/Nano-Science and Technology, Shanghai Jiaotong University, Shanghai 200300, P. R. China;
Guangqian Yang: Institute to Applied Chemistry, Shanghai Normal University, Shanghai 200234, P. R. China
Jian Chen: Research Institute of Micro/Nano-Science and Technology, Shanghai Jiaotong University, Shanghai 200300, P. R. China
Rongjun Zhang: School of Information Science and Engineering, Fudan University, Shanghai 200433, P. R. China
Weimin Zhou: Shanghai Nanotechnology Promotion Center, Shanghai 200237, P. R. China
Yanbo Liu: Shanghai Nanotechnology Promotion Center, Shanghai 200237, P. R. China
Jing Zhang: Shanghai Nanotechnology Promotion Center, Shanghai 200237, P. R. China
Qingkang Wang: Research Institute of Micro/Nano-Science and Technology, Shanghai Jiaotong University, Shanghai 200300, P. R. China

Surface Review and Letters (SRL), 2009, vol. 16, issue 03, 367-373

Abstract: A significant enhancement in light extraction from colloidalZnOQD films was observed on an addition of a layer of two-dimensional photonic crystal (2D-PC) structure. The PCs with a rectangular-lattice air-hole array pattern with the period of 1.4 μm and the hole-size of 400 nm were fabricated by UV-nanoimprint lithography (UV-NIL). Unlike the commonly utilized electron-beam lithographic technique, the UV-NIL process can make patterns over a large area with high throughput. The resultant colloidal zinc oxide(ZnO)QD films with a PC pattern add-on had nearly double the output power, as measured from the top of the film.

Keywords: ZnOQDs; UV-nanoimprint lithography; photonic crystals; light extraction (search for similar items in EconPapers)
Date: 2009
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DOI: 10.1142/S0218625X09012731

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