LARGE AREA PARALLEL SURFACE NANOSTRUCTURING WITH LASER IRRADIATION THROUGH MICROLENS ARRAYS

C. S. Lim, M. H. Hong (), Y. Lin, L. S. Tan, A. Senthil Kumar and M. Rahman
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C. S. Lim: Department of Mechanical Engineering, National University of Singapore, Engineering Drive 3, Singapore 117576, Singapore
M. H. Hong: Data Storage Institute, Agency for Science, Technology and Research, DSI Building, 5 Engineering Drive 1, Singapore 117608, Singapore;
Y. Lin: Department of Electrical and Computer Engineering, National University of Singapore, Engineering Drive 3, Singapore 117576, Singapore;
L. S. Tan: Department of Electrical and Computer Engineering, National University of Singapore, Engineering Drive 3, Singapore 117576, Singapore;
A. Senthil Kumar: Department of Mechanical Engineering, National University of Singapore, Engineering Drive 3, Singapore 117576, Singapore
M. Rahman: Department of Mechanical Engineering, National University of Singapore, Engineering Drive 3, Singapore 117576, Singapore

Surface Review and Letters (SRL), 2010, vol. 17, issue 03, 383-387

Abstract: In the past decade, the development of nanoelectronics and nano-optics has attracted much interest in surface nanostructuring of semiconductor materials. The irradiation of a microlens array by a laser beam generates many focused light spots, which can act as a direct writing tool on photo-polymer materials. This maskless surface nanostructuring technique enables thousands to millions of identical nano-features to be patterned in a couple of laser pulses. Scanning electron microscopy (SEM) and atomic force microscopy (AFM) images show that nano-features were patterned uniformly on the substrate surface, which suggests a versatile way of parallel surface nanostructuring over a large area. The simulation results of the energy flux distribution at the focal plane of the microlens arrays will also be discussed.

Keywords: Microlens arrays; nanopatterning (search for similar items in EconPapers)
Date: 2010
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DOI: 10.1142/S0218625X10011085

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