APPLICATION OF PCVD PROCESS TO UNIFORM COATING OFTiO2THIN FILMS ON POLYPROPYLENE BEADS

Dong-Joo Kim, Hung Cuong Pham and Kyo-Seon Kim ()
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Dong-Joo Kim: Department of Chemical Engineering, Kangwon National University, Chuncheon, Kangwon-Do 200-701, Korea
Hung Cuong Pham: Department of Chemical Engineering, Kangwon National University, Chuncheon, Kangwon-Do 200-701, Korea
Kyo-Seon Kim: Department of Chemical Engineering, Kangwon National University, Chuncheon, Kangwon-Do 200-701, Korea

Surface Review and Letters (SRL), 2010, vol. 17, issue 03, 329-335

Abstract: The growth of theTiO2thin films coated on the polypropylene beads was analyzed experimentally in a rotating cylindrical plasma chemical vapor deposition (PCVD) reactor. The precursors for the thin films were generated by plasma reactions, and they deposited on the polypropylene beads to become the uniform thin films. TheTiO2thin films grow more quickly on the polypropylene beads by increasing the mass flow rate of TTIP, or the rotation speed of the reactor. The smaller number of polypropylene beads in the reactor increases the growth rate of the thin films. The high-qualityTiO2thin films can be coated on particles uniformly by using the rotating cylindrical PCVD process. The particles coated with high-qualityTiO2thin films can be applied to the removal of air and water pollutants by a photodegradation reaction ofTiO2.

Keywords: Particle coating; TiO2thin films; rotating cylindrical PCVD reactor; particle growth; polypropylene beads (search for similar items in EconPapers)
Date: 2010
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DOI: 10.1142/S0218625X10013928

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