ZnOQUANTUM DOT HYBRID LUMINESCENT RESISTS FOR NANOIMPRINT LITHOGRAPHY

Xiaoli Li, Guangqian Yang, Xibing Yu, Weimin Zhou, Jing Zhang, Yanbo Liu and Qingkang Wang
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Xiaoli Li: Research Institute of Micro/Nano-Science and Technology, Shanghai Jiaotong University, Shanghai 200300, P. R. China;
Guangqian Yang: Institutes to Applied Chemistry, Shanghai Normal University, Shanghai 200234, P. R. China
Xibing Yu: Institutes to Applied Chemistry, Shanghai Normal University, Shanghai 200234, P. R. China
Weimin Zhou: Shanghai Nanotechnology Promotion Center, Shanghai 200237, P. R. China
Jing Zhang: Shanghai Nanotechnology Promotion Center, Shanghai 200237, P. R. China
Yanbo Liu: Shanghai Nanotechnology Promotion Center, Shanghai 200237, P. R. China
Qingkang Wang: Research Institute of Micro/Nano-Science and Technology, Shanghai Jiaotong University, Shanghai 200300, P. R. China

Surface Review and Letters (SRL), 2010, vol. 17, issue 05n06, 457-461

Abstract: We report the preparation ofZnOquantum dot hybrid luminescent resists for nanoimprint lithography. Photoluminescence spectra indicate thatZnOQDs@AMONIL have a significant increase in the luminescent intensity, an obvious blue-shift of emission peak and the Stoke's shift, revealing thatZnOQDs@AMONIL have dramatic luminescent property change instead of inhibiting or only preserving the optical properties of pureZnOQDs. The fabrication of two-dimensional (2D) photonic crystal structure on theZnOQDs@AMONIL by UV-based nanoimprint lithography is demonstrated at last, which confirms the luminescentZnOQDs@AMONIL reliable processing capabilities in wavelength-scale and envisions its promising applications in the optoelectronic micro-/nanodevices.

Keywords: ZnOquantum dot; nanoimprint lithography; photonic crystals; resist (search for similar items in EconPapers)
Date: 2010
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DOI: 10.1142/S0218625X10014363

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