DIELECTRIC PROPERTIES OF PLASMA POLYMERIZED N,N,3,5 TETRAMETHYLANILINE THIN FILMS

H. Akther and A. H. Bhuiyan ()
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H. Akther: Department of Physics, Bangladesh University of Engineering and Technology (BUET), Dhaka 1000, Bangladesh
A. H. Bhuiyan: Department of Physics, Bangladesh University of Engineering and Technology (BUET), Dhaka 1000, Bangladesh

Surface Review and Letters (SRL), 2011, vol. 18, issue 01n02, 53-60

Abstract: Plasma polymerized thin films of aluminium/thin film/aluminium configuration were deposited at room temperature by a parallel plate capacitively coupled glow discharge reactor using N,N,3,5 tetramethylaniline (TMA) as a precursor. The infrared spectroscopic analyses revealed that plasma polymerized TMA (PPTMA) films contained an aromatic ring structure with NC and CH side groups, presence ofC=Owas also evident. The differential thermal analysis and thermogravimetric analysis of PPTMA thin film was thermally stable up to about 505 K. The scanning electron microscopy of PPTMA thin film showed a smooth, flawless and pinhole free surface. The capacitance and ac electrical conductance of PPTMA thin films were measured as functions of frequency (100

Keywords: Dielectric properties; plasma polymerized N; N; 3; 5 tetramethylaniline (search for similar items in EconPapers)
Date: 2011
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DOI: 10.1142/S0218625X11014485

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