THICKNESS DEPENDENCE OF BUCKLING PATTERNS OFTaFILMS SPUTTERED ON GLASS SUBSTRATES

Yong-Ju Zhang (), Sen-Jiang Yu (), Hong Zhou, Miao-Gen Chen and Zhi-Wei Jiao
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Yong-Ju Zhang: Department of Physics, Taizhou University, Linhai 317000, P. R. China
Sen-Jiang Yu: Department of Physics, China Jiliang University, Hangzhou 310018, P. R. China
Hong Zhou: Department of Physics, China Jiliang University, Hangzhou 310018, P. R. China
Miao-Gen Chen: Department of Physics, China Jiliang University, Hangzhou 310018, P. R. China
Zhi-Wei Jiao: Department of Physics, China Jiliang University, Hangzhou 310018, P. R. China

Surface Review and Letters (SRL), 2012, vol. 19, issue 03, 1-5

Abstract: Tantalum (Ta) films deposited on glass substrates have been prepared by a direct current magnetron sputtering method, and buckling patterns induced by residual compressive stress are investigated in detail. When the film thickness increases, the buckling morphologies evolve from straight-sided buckle network to wavy or wormlike wrinkles gradually, and finally change into telephone cord buckles. The geometrical parameters of the buckling patterns are found to increase linearly with the film thickness. Based on the geometrical parameters of the buckling patterns, the mechanical properties of theTafilms are also discussed in the frame of continuum elastic theory.

Keywords: Thin film; sputtering; stress; buckling; elastic properties (search for similar items in EconPapers)
Date: 2012
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DOI: 10.1142/S0218625X12500229

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