EFFECT OF SUBSTRATE TEMPERATURE ON MICRO-STRUCTURAL PROPERTIES OFTiANDTiNFILMS DEPOSITED BY E-BEAM EVAPORATION TECHNIQUE

Nishat Arshi, Junqing Lu (), Bon Heun Koo, Chan Gyu Lee and Faheem Ahmed
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Nishat Arshi: School of Nano and Advanced Materials Engineering, Changwon National University, 9 Sarim dong Changwon-641-773, South Korea
Junqing Lu: School of Nano and Advanced Materials Engineering, Changwon National University, 9 Sarim dong Changwon-641-773, South Korea
Bon Heun Koo: School of Nano and Advanced Materials Engineering, Changwon National University, 9 Sarim dong Changwon-641-773, South Korea
Chan Gyu Lee: School of Nano and Advanced Materials Engineering, Changwon National University, 9 Sarim dong Changwon-641-773, South Korea
Faheem Ahmed: School of Nano and Advanced Materials Engineering, Changwon National University, 9 Sarim dong Changwon-641-773, South Korea

Surface Review and Letters (SRL), 2012, vol. 19, issue 04, 1-7

Abstract: We report the deposition ofTiandTiNfilms onSi/SiO2(100) substrate using e-beam evaporation technique. The influence of substrate temperature on the structural and morphological properties has been studied. The structure and morphology of the deposited films were analyzed by X-ray diffraction (XRD) and field emission scanning electron microscope (FESEM) measurements, respectively. XRD patterns reveal the FCC symmetry for both theTiandTiNfilms. The grain size of the films was found to increase with the increase in substrate temperature. FESEM micrographs showed a smooth morphology of the film with columnar grain structure.

Keywords: Thin films; vapor deposition; texture; X-ray diffraction; titanium nitride (search for similar items in EconPapers)
Date: 2012
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DOI: 10.1142/S0218625X12500370

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