SELF-ASSEMBLING BEHAVIOR AND INHIBITION EFFECT OF DODECANETHIOL SELF-ASSEMBLED MONOLAYERS ON COPPER SURFACE

Xiulan Zhang (), Heng Zhang, Yihong Yang and Zhenyu Chen ()
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Xiulan Zhang: Key Laboratory for Green Chemical Process of Ministry of Education, Wuhan Institute of Technology, Wuhan 430073, China
Heng Zhang: Key Laboratory for Green Chemical Process of Ministry of Education, Wuhan Institute of Technology, Wuhan 430073, China
Yihong Yang: Key Laboratory for Green Chemical Process of Ministry of Education, Wuhan Institute of Technology, Wuhan 430073, China
Zhenyu Chen: School of Chemistry, Huazhong University of Science and Technology, Wuhan 430074, China

Surface Review and Letters (SRL), 2013, vol. 20, issue 03n04, 1-6

Abstract: The self-assembling behavior and inhibition effect of dodecanethiol self-assembled monolayers (SAMs) on copper surface were investigated by atomic force microscopy (AFM) and electrochemical methods. The assembling process was monitored by AFM phase images. The assembling time influences the corrosion protection efficiency of dodecanethiol SAMs. Surface friction significantly decreases when the copper surface is covered by SAMs.

Keywords: Self-assembled monolayers; copper; dodecanethiol; atomic force microscopy (search for similar items in EconPapers)
Date: 2013
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DOI: 10.1142/S0218625X13500285

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