SIMULATION OPTIMIZATION OF THE HEAT TRANSFER CONDITIONS IN HFCVD DIAMOND FILM GROWTH INSIDE HOLES

Xinchang Wang, Jianguo Zhang, Tao Zhang, Bin Shen and Fanghong Sun ()
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Xinchang Wang: School of Mechanical Engineering, Shanghai Jiao Tong University, Shanghai 200240, P. R. China
Jianguo Zhang: School of Mechanical Engineering, Shanghai Jiao Tong University, Shanghai 200240, P. R. China
Tao Zhang: School of Mechanical Engineering, Shanghai Jiao Tong University, Shanghai 200240, P. R. China
Bin Shen: School of Mechanical Engineering, Shanghai Jiao Tong University, Shanghai 200240, P. R. China
Fanghong Sun: School of Mechanical Engineering, Shanghai Jiao Tong University, Shanghai 200240, P. R. China

Surface Review and Letters (SRL), 2013, vol. 20, issue 03n04, 1-13

Abstract: Finite volume method (FVM) is adopted in the present investigation to simulate the temperature and reactant gas velocity distributions in hot filament chemical vapor deposition (HFCVD) diamond film growth inside holes, using a detailed 3D computational model well in accordance with the actual reactor. The influences of the heat transfer characteristic of the substrate and the auxiliary heat transfer conditions are firstly studied by control variable method (CVM), including the thermal conductivity of the substratek, the size of the red bronze support blockV(x × y × z), the cooling water fluxQw, the reactant gas fluxQg, the arrangement of the gas outletsAoutand the emissivities of the different solid surfaces ϵ. Thereafter, the substrate temperature data measured in the actual HFCVD reactor with three chosen groups of parameters are compared with those obtained from the simulations, presenting similar trends and small deviations less than 5%. Moreover, the auxiliary heat transfer conditions are optimized for both the WC-CoandSiCsubstrates based on the simulation and measurement results, and corresponding deposition parameters are also determined. Furthermore, HFCVD diamond films are deposited on the inner surfaces of both the substrates under the optimized conditions. The characterization results show that high-quality diamond films with uniform thickness and fine-faceted crystals are obtained, indicating that this optimization method focusing on the heat transfer conditions is feasible and correct.

Keywords: Simulation; substrate temperature distribution; gas velocity distribution; heat transfer condition; HFCVD diamond film; optimization method (search for similar items in EconPapers)
Date: 2013
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DOI: 10.1142/S0218625X13500315

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