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STRUCTURE AND PHOTOCATALYTIC PROPERTIES OFN-DOPEDTiO2-xFILMS PREPARED BYN-ION IMPLANTATION

Hongli Feng, P. Z. Si (), Y. C. Shi, C. H. Jin, X. L. Zhang, J. J. Liu, S. J. Yu, G. H. Zhang and H. L. Ge
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P. Z. Si: Zhejiang Key Laboratory of Magnetic Materials, China Jiliang University, Hangzhou 310018, P. R. China
Y. C. Shi: Zhejiang Key Laboratory of Magnetic Materials, China Jiliang University, Hangzhou 310018, P. R. China
C. H. Jin: Zhejiang Key Laboratory of Magnetic Materials, China Jiliang University, Hangzhou 310018, P. R. China
X. L. Zhang: Zhejiang Key Laboratory of Magnetic Materials, China Jiliang University, Hangzhou 310018, P. R. China
J. J. Liu: Faculty of Materials Science & Chemical Engineering, Ningbo University, Ningbo 315211, P. R. China
S. J. Yu: Zhejiang Key Laboratory of Magnetic Materials, China Jiliang University, Hangzhou 310018, P. R. China
G. H. Zhang: Zhejiang Key Laboratory of Magnetic Materials, China Jiliang University, Hangzhou 310018, P. R. China
H. L. Ge: Zhejiang Key Laboratory of Magnetic Materials, China Jiliang University, Hangzhou 310018, P. R. China

Surface Review and Letters (SRL), 2013, vol. 20, issue 06, 1-4

Abstract: Nitrogen dopedTiO2-xfilms have been prepared by usingN-ion implantation method. X-ray diffraction patterns of theN-dopedTiO2-xfilms could be indexed with rutileTiO2andTi7O13in structure. XPS measurements revealed a 2.73 atm.% concentration ofNatoms in theN-doped films and twoN1 s photoelectron binding energies at 396.3 and 399.9 eV originating fromN-dopedTiO2andN-dopedTi7O13, respectively. The photocatalytic properties of theN-doped films under visible light have been investigated by degradation of methylene blue solution.

Keywords: Nitrogen dopedTiO2; thin films; XPS; structural; photocatalytic properties; ion implantation (search for similar items in EconPapers)
Date: 2013
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DOI: 10.1142/S0218625X13500595

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