EFFECT OF SUBSTRATE TEMPERATURE ON MICROSTRUCTURE AND WEAR BEHAVIOR OF MAGNETRON SPUTTEREDCrCuNFILMS

Shuyong Tan (), Xuhai Zhang, Yan Zhang and Jianqing Jiang
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Shuyong Tan: Department of Materials Science and Engineering, Nanjing Institute of Technology, Nanjing 211167, P. R. China
Xuhai Zhang: School of Material Science and Engineering, Southeast University, Nanjing 211189, P. R. China
Yan Zhang: Department of Materials Science and Engineering, Nanjing Institute of Technology, Nanjing 211167, P. R. China
Jianqing Jiang: School of Material Science and Engineering, Southeast University, Nanjing 211189, P. R. China

Surface Review and Letters (SRL), 2013, vol. 20, issue 06, 1-7

Abstract: CrCuNfilms were deposited under different substrate temperatures by direct current (DC) magnetron sputtering. The structure and wear resistance of the films were then studied. The substrate temperature has almost no effect on the film composition, phase constitution and preferred orientation. TheCrCuNfilms have 3 at.%Cuand consist ofCrNphases withCrN(200)preferential growth independent of the substrate temperature. But a strong effect of the substrate temperature on the wear behavior is noticed. The film prepared under the substrate temperature of 100°C has the best wear performance. Its friction coefficient and wear rate are 0.1 and 6.6 × 10-6mm3/Nm, respectively.

Keywords: CrCuNfilms; magnetron sputtering; structure; wear resistance (search for similar items in EconPapers)
Date: 2013
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DOI: 10.1142/S0218625X13500613

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