EFFECT OFAlDOPING CONCENTRATION ON MICROSTRUCTURE, PHOTOELECTRIC PROPERTIES AND DOPED MECHANISM OF AZO FILMS
Ying Xu (),
Yanqing Cai,
Linyan Hou and
Penghua Ma
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Ying Xu: College of Materials Science and Engineering, Hebei United University, Hebei Province Key Laboratory of Inorganic Nonmetallic Materials, Tangshan 063009, P. R. China
Yanqing Cai: School of Materials Science and Metallurgy, Northeastern University, Shenyang 110004, P. R. China
Linyan Hou: College of Materials Science and Engineering, Hebei United University, Hebei Province Key Laboratory of Inorganic Nonmetallic Materials, Tangshan 063009, P. R. China
Penghua Ma: College of Materials Science and Engineering, Hebei United University, Hebei Province Key Laboratory of Inorganic Nonmetallic Materials, Tangshan 063009, P. R. China
Surface Review and Letters (SRL), 2014, vol. 21, issue 03, 1-7
Abstract:
AldopedZnO(AZO) thin films were deposited on a glass substrate by atmospheric pressure chemical vapor deposition (APCVD) method. Effect ofAldoping concentration on microstructure, photoelectric properties and doped mechanism of AZO thin films were investigated. The analysis results revealed that the structural properties of the films possessed crystalline structure with a preferred (002) orientation. The best crystallization quality and minimum electrical resistivity was obtained at 5 at.%Aldoped films and the minimum resistivity was 6.6 × 10-4Ω ⋅ cm. Uniform granular grains were observed on the surface of AZO films, and the average optical transmittance was above 80% in the visible range. The doped mechanism of AZO films was analyzed as follows. WithAldoping inZnOfilms,AlZnsubstitute andAliinterstice were produced, which decreased the resistivity of films. While after the limit value and with the continuing increase ofAldoping concentration, free electrons were consumed and the resistivity of films increased.
Keywords: AZO films; APCVD method; microstructure; photoelectric properties; conductive mechanism (search for similar items in EconPapers)
Date: 2014
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DOI: 10.1142/S0218625X14500401
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