TRANSPORT PROPERTIES OFCrO2(100) FILM GROWN ONTiO2BY A SIMPLE ATMOSPHERE PRESSURE CHEMICAL VAPOR DEPOSITION

Liang Xie (), Jin Zhi Zhang, Nai Yi Cui and Hong Guang Zhang
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Liang Xie: Department of Physical and Chemical Sciences, North China University of Technology, Beijing 100144, P. R. China
Jin Zhi Zhang: Department of Physical and Chemical Sciences, North China University of Technology, Beijing 100144, P. R. China
Nai Yi Cui: Department of Physical and Chemical Sciences, North China University of Technology, Beijing 100144, P. R. China
Hong Guang Zhang: College of Science, Nanjing University of Posts and Telecommunications, Nanjing 210023, P. R. China

Surface Review and Letters (SRL), 2014, vol. 21, issue 04, 1-5

Abstract: EpitaxialCrO2(100)-oriented film was successfully fabricated onTiO2(100) substrate by a simple chemical vapor deposition in a two-zone furnace with oxygen flow from aCrO3precursor. The transport measurements show that theCrO2film is metallic with a small residual resistivity 4 μΩ cm down to 0.6 K. The temperature dependence of resistivity was best described by a phenomenological expressionρ(T) = ρ0+ AT2exp(-Δ/T)over the range of 0.6–300 K with Δ = 123.6 K. The magnetization of the film becomes saturated in a relatively low field with a small coercive field. The temperature dependence of magnetization shows Bloch'sT3/2law and the slope of the curve suggests a critical wavelength of λΔ~ 26.6 Å beyond which spin-flip scattering becomes important.

Keywords: CrO2(100) film; transport properties; magnetic properties (search for similar items in EconPapers)
Date: 2014
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DOI: 10.1142/S0218625X14500553

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